The speciality compounds business of Sabic Innovative Plastics (SIP, Bergen op Zoom / The Netherlands; www.sabic-ip.com) has developed the ultra-pure, transparent (UPT) “Stat-Loy” 63000CT series compounds to satisfy the requirement for clean plastics to be used in the manufacture of integrated circuits employing next-generation argon-fluoride (ArF) laser photolithography technology. SIP says that when they are used in wafer protection devices, the compounds can prevent damage from outgassing that can contaminate wafers, increase rejects, and raise costs in the manufacturing process.

The effect of contaminants from plastic outgassing is more pronounced when using higher-powered ArF lasers. If volatile organic compounds or leachable ions reach the surface of silicon wafers, photomasks or reticles, they can damage the device or cause it to misfunction. SIP claims that the high purity and anti-static properties of the new compounds allow ArF lasers to produce extremely fine circuitry, down to 45 nm and below.